Model # NIWD, OXWD, SIWD
Membrane in Silicon
Description: Applied NanoStructures’ NIWD product is designed for various biological applications. The membrane is made with either, low stress silicon nitride, silicon oxide or silicon which can than be coated with various materials. The size of the chip and window and thickness of the membrane can be varied to fit different applications.
Specifications:
|
|
Parameter |
Typical Value |
Range |
|
Chip |
Thickness (µm) |
300 |
290-310 |
|
Width and Length (µm) |
6000x6000 |
5950-6050 |
|
|
Membrane (nitride, oxide, or silicon) |
Thickness (nm) |
200 |
180-220 |
|
Window Size Top (µm) |
600x600 |
540-660 |
|
|
Window Size Bottom (µm) |
200x200 |
180-220 |
|
|
Coating |
Variable Material and Thickness |
||
